THERMAL-DEGRADATION OF METHYL METHACRYLATE-METHACRYLIC ACID COPOLYMERS

被引:1
作者
WASCHE, M
KUNZE, R
PFEIFFER, K
GNAUCK, R
机构
[1] INST ORGAN CHEM,O-1199 BERLIN,GERMANY
[2] BUNDESANSTALT MAT PRUFUNG,W-1000 BERLIN 45,GERMANY
关键词
D O I
10.1002/actp.1992.010430108
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Increase of radiation sensitivity of polymeric resists is very important for applications in the semiconductor industry. By thermal pretreatment of methyl methacrylate-methacrylic acid copolymers in acetophenon solution it is shown that with liberation of water and methanol intramolecular formation of cyclic anhydride groups takes place. These groups are preferentially decomposed by ionizing radiation. Thermal degradation and analysis of the anhydride content are investigated by combined application of TG, MTA, TL, and NMR methods.
引用
收藏
页码:34 / 37
页数:4
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