HIGH-PURITY MOLECULAR-BEAM EPITAXY GROWN ALGAAS

被引:6
作者
CUNNINGHAM, JE
TSANG, WT
CHIU, TH
SCHUBERT, EF
DITZENBERGER, JA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 03期
关键词
D O I
10.1116/1.583787
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:761 / 761
页数:1
相关论文
共 4 条
[1]   MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-PURITY ALGAAS [J].
CUNNINGHAM, JE ;
TSANG, WT ;
CHIU, TH ;
SCHUBERT, EF .
APPLIED PHYSICS LETTERS, 1987, 50 (12) :769-771
[2]   ADSORPTION OF XENON ON GROUP-VIII AND IB METALS STUDIED BY PHOTOELECTRIC WORK FUNCTION MEASUREMENTS [J].
NIEUWENHUYS, BE ;
VANAARDE.OG ;
SACHTLER, WM .
CHEMICAL PHYSICS, 1974, 5 (03) :418-428
[3]   ALLOY BROADENING IN PHOTOLUMINESCENCE SPECTRA OF ALXGA1-XAS [J].
SCHUBERT, EF ;
GOBEL, EO ;
HORIKOSHI, Y ;
PLOOG, K ;
QUEISSER, HJ .
PHYSICAL REVIEW B, 1984, 30 (02) :813-820
[4]   PHOTOLUMINESCENCE OF ALXGA1-XAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
WICKS, G ;
WANG, WI ;
WOOD, CEC ;
EASTMAN, LF ;
RATHBUN, L .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5792-5796