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COMBINED AUGER-ELECTRON SPECTROSCOPY AND ELECTRON-IMPACT DESORPTION STUDIES OF SILICON SURFACES

被引：11
作者：
NISHIJIM.M
MUROTANI, T
机构：
来源：
SURFACE SCIENCE | 1972年 / 32卷 / 02期
关键词：
D O I：
10.1016/0039-6028(72)90172-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：459 / &
相关论文
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[2]   CONTAMINANTS ON CHEMICALLY ETCHED SILICON SURFACES - LEED-AUGER METHOD [J].
CHANG, CC .
SURFACE SCIENCE, 1970, 23 (02) :283-&
[3]   ELECTRON-STIMULATED DESORPTION AS A TOOL FOR STUDIES OF CHEMISORPTION - REVIEW [J].
MADEY, TE ;
YATES, JT .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (04) :525-&
[4]  
Many A., 1965, SEMICONDUCTOR SURFAC
[5]  
NISHIJIMA M, TO BE PUBLISHED
[6]   The focusing of charged particles by a spherical condenser [J].
Purcell, EM .
PHYSICAL REVIEW, 1938, 54 (10) :818-826
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