SPIN DEPENDENT RECOMBINATION IN PT-DOPED SILICON P-N-JUNCTIONS

被引:18
作者
CHRISTMANN, P
WETZEL, C
MEYER, BK
ASENOV, A
ENDROS, A
机构
[1] UNIV GLASGOW,DEPT ELECT & ELECTR ENGN,GLASGOW G12 8QQ,SCOTLAND
[2] SIEMENS AG,ZFE ME FKE ABT 42,W-8000 MUNICH,GERMANY
关键词
D O I
10.1063/1.107160
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electrically detected magnetic resonance experiments showing spin dependent recombination in commercial p-n diodes are presented. The observed anisotropy in the g values along with the marked shift from the free electron g-value point to a metal-vacancy complex. Deep level transient spectroscopy reveals the presence of the Pt acceptor level (0/-) at E(c) - 0.23 eV and the donor level (+/0) at E(v) + 0.32 eV in the same device. Calculations of the recombination rates support that spin dependent recombination occurs at the Pt (+/0) donor level.
引用
收藏
页码:1857 / 1859
页数:3
相关论文
共 12 条
  • [11] WATKINS GD, 1964, RAD DAMAGE SEMICONDU, P00097
  • [12] 1989, SEMICOND SCI TECH, V4, P12