LASER-PRODUCED PLASMAS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：30

作者：

SILFVAST, WT

RICHARDSON, MC

BENDER, H

HANZO, A

YANOVSKY, V

JIN, F

THORPE, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.585942

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Laser-produced plasmas are one of the most likely sources to be used for soft x-ray projection lithography. The characteristics of these sources are described in terms of the expected radiation efficiency within the illumination bandwidth of a lithographic system. Measurements of the plasma particulate emission are described and techniques for interdicting this emission before it reaches the illumination optics are discussed. The laser requirements are obtained for a lithographic system producing a wafer rate of 60, 6 in. wafers per hour.

引用

页码：3126 / 3133

页数：8

共 22 条

[1] MULTILAYERS FOR X-RAY OPTICS [J].

BARBEE, TW .

OPTICAL ENGINEERING, 1986, 25 (08) :898-915

[2] VARIANCE OF THE DISTRIBUTIONS OF ENERGY-LEVELS AND OF THE TRANSITION ARRAYS IN ATOMIC SPECTRA .3. CASE OF SPIN-ORBIT-SPLIT ARRAYS [J].

BAUCHEARNOULT, C ;

BAUCHE, J ;

KLAPISCH, M .

PHYSICAL REVIEW A, 1985, 31 (04) :2248-2259

[3]

BERKOWITZ J, 1979, PHOTOABSORPTION PHOT, pCH5

[4] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M [J].

BJORKHOLM, JE ;

BOKOR, J ;

EICHNER, L ;

FREEMAN, RR ;

GREGUS, J ;

JEWELL, TE ;

MANSFIELD, WM ;

MACDOWELL, AA ;

RAAB, EL ;

SILFVAST, WT ;

SZETO, LH ;

TENNANT, DM ;

WASKIEWICZ, WK ;

WHITE, DL ;

WINDT, DL ;

WOOD, OR ;

BRUNING, JH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06) :1509-1513

[5] INVESTIGATION OF A LASER-PRODUCED PLASMA VUV LIGHT-SOURCE [J].

BRIDGES, JM ;

CROMER, CL ;

MCILRATH, TJ .

APPLIED OPTICS, 1986, 25 (13) :2208-2214

[6]

CEGLIO N, IN PRESS J XRAY SCI

[7] DEBRIS AND VUV EMISSION FROM A LASER-PRODUCED PLASMA OPERATED AT 150 HZ USING A KRYPTON FLUORIDE LASER [J].

GINTER, ML ;

MCILRATH, TJ .

APPLIED OPTICS, 1988, 27 (05) :885-889

[8]

HUGHES TP, 1975, PLASMAS LASER LIGHT, P287

[9]

KAUFFMAN RL, 1991, OSA PROC, V12, P68

[10]

KAUFFMAN RL, COMMUNICATION

← 1 2 3 →