RF GLOW-DISCHARGE SPUTTERING MODEL

被引：21

作者：

LOGAN, JS ^{[1
]}

KELLER, JH ^{[1
]}

SIMMONS, RG ^{[1
]}

机构：

[1] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569181

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：92 / 97

页数：6

共 16 条

[1]

ACTON JR, 1963, COLD CATHODE DISCHAR, P83

[2] SPUTTERING AND ION-SOURCE TECHNOLOGY [J].

ANDERSEN, HH .

[3]

Brown S.C., 1967, BASIC DATA PLASMA PH

[4]

CARTER G, 1968, ION BOMBARDMENT SOLI, pCH7

[5] SPUTTERING OF AU BY 45-KEV IONS FOR DIFFERENT FLUENCES [J].

EERNISSE, EP .

[6] RADIO FREQUENCY CHARACTERISTICS OF THE PLASMA SHEATH [J].

GOULD, RW .

PHYSICS LETTERS, 1964, 11 (03) :236-237

[7]

JOHNSON, 1951, TRANSMISSION LINES N, P290

[8] SPUTTERING STUDIES OF INSULATORS BY MEANS OF LANGMUIR PROBES [J].

JORGENSO.GV ;

WEHNER, GK .

[9]

KLYARFELD BN, 1969, SOV PHYS TECH PHYS-U, V13, P1056

[10] APPLICATION OF RF DISCHARGES TO SPUTTERING [J].

KOENIG, HR ;

MAISSEL, LI .