REACTIVE ION ETCHING OF ALUMINUM SILICON IN BBR3/CL2 AND BCL3/CL2 MIXTURES

被引：14

作者：

BELL, HB ^{[1
]}

ANDERSON, HM ^{[1
]}

LIGHT, RW ^{[1
]}

机构：

[1] UNIV NEW MEXICO,DEPT CHEM & NUCL ENGN,ALBUQUERQUE,NM 87131

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 05期

关键词：

D O I：

10.1149/1.2095919

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1184 / 1191

页数：8

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