ORIENTED NICKEL-TITANIUM SHAPE MEMORY ALLOY-FILMS PREPARED BY ANNEALING DURING DEPOSITION

被引：79

作者：

GISSER, KRC

BUSCH, JD

JOHNSON, AD

ELLIS, AB

机构：

[1] UNIV WISCONSIN,DEPT CHEM,MADISON,WI 53706

[2] TINI ALLOY CO,OAKLAND,CA 94608

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 14期

关键词：

D O I：

10.1063/1.108434

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nickel-titanium shape memory alloy films, between 2 and 10 mum thick, were sputter deposited onto (100) silicon substrates. Films deposited onto a substrate at ambient temperature were amorphous; however, several post-deposition annealing procedures produced crystalline films exhibiting the B2-to-B19' phase transition that gives rise to the shape memory effect. Films that were deposited onto a heated substrate, 350-460-degrees-C, crystallized during deposition, eliminating the need for a separate annealing step. Powder x-ray diffraction indicated that these films were highly oriented, with the NiTi (110) B2 face parallel to the silicon substrate (100) face.

引用

页码：1632 / 1634

页数：3