CROSS SLIP OF SINGLE DISSOCIATED SCREW DISLOCATIONS IN SILICON AND GERMANIUM

被引:20
作者
MOLLER, HJ
EWALDT, H
HAASEN, P
机构
[1] Institut Für Metallphysik, Universität Göttingen
[2] Valvo GmbH, Hamburg, D-2000, Burchhardtstr
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 55卷 / 02期
关键词
D O I
10.1002/pssa.2210550214
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Isolated screw segments intersecting a surface are shown to cross slip during annealing at T > > 0.6Tm in germanium and T > 0.7Tm in silicon. The process is investigated quantitatively by the double etching method and by X‐ray topography. The activation energy can be determined and is compared with theoretical models of the cross slip process. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA
引用
收藏
页码:469 / 478
页数:10
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