VACUUM-DEPOSITED GOLD-FILMS .1. FACTORS AFFECTING THE FILM MORPHOLOGY

Thin (300-1000 angstrom) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering or evaporation. The films were characterized by transmission electron microscopy (TEM), electron diffraction (ED) and voltammetric measurements. Gold sputtering produces pebble-type structures with very small grains and no crystallographic texture. Evaporation of gold onto glass or mica produces large, flat crystallites, with a pronounced {111} texture, while on smooth silicon (100) it results in non-textured films. Annealing of the films at 250-degrees-C always has the effect of grain enlargement, and, in the case of gold on glass or mica, enhancement of the {111} texture.