VACUUM-DEPOSITED GOLD-FILMS .1. FACTORS AFFECTING THE FILM MORPHOLOGY

被引：179

作者：

GOLAN, Y ^{[1
]}

MARGULIS, L ^{[1
]}

RUBINSTEIN, I ^{[1
]}

机构：

[1] WEIZMANN INST SCI,DEPT MAT & INTERFACES,IL-76100 REHOVOT,ISRAEL

来源：

SURFACE SCIENCE | 1992年 / 264卷 / 03期

关键词：

D O I：

10.1016/0039-6028(92)90188-C

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin (300-1000 angstrom) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering or evaporation. The films were characterized by transmission electron microscopy (TEM), electron diffraction (ED) and voltammetric measurements. Gold sputtering produces pebble-type structures with very small grains and no crystallographic texture. Evaporation of gold onto glass or mica produces large, flat crystallites, with a pronounced {111} texture, while on smooth silicon (100) it results in non-textured films. Annealing of the films at 250-degrees-C always has the effect of grain enlargement, and, in the case of gold on glass or mica, enhancement of the {111} texture.

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页码：312 / 326

页数：15

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