THE BEHAVIOR OF NON-ROTATIONAL STRIATIONS IN SILICON

被引：23

作者：

KOLKER, H

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1980年 / 50卷 / 04期

关键词：

D O I：

10.1016/0022-0248(80)90147-5

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：852 / 858

页数：7

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