INFLUENCE OF THERMAL AGING ON TINX THIN-FILM RESISTORS

被引:1
作者
BEENSHMARCHWICKA, G
BERLICKI, T
机构
[1] Institute of Electronic Technology, Technical University of Wrocław, 50-372 Wrocław
关键词
D O I
10.1016/0040-6090(79)90313-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have examined the dispersion values of thin film resistors of titanium nitride obtained by reactive evaporation of titanium in a nitrogen atmosphere and subjected to thermal aging. We have found that the dependence of relative changes ΔR/R of the resistance on the aging time t is described by the expression ΔR/R = At 1 2. The mean square deviation of the resistance variations as a function of ΔR/R is a straight line on a log-log plot with a slope of 0.8-1. This has been explained by the dispersion of material constants between the resistors. © 1979.
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页码:255 / 257
页数:3
相关论文
共 8 条
[1]   AGING MECHANISMS IN THIN-FILM CR, CRAU AND TINX RESISTORS [J].
BEENSHMARCHWICKA, G ;
DEMBICKAJELLONKOWA, S ;
KROLSTEPNIEWSKA, L .
THIN SOLID FILMS, 1976, 36 (02) :361-363
[2]  
Berry R.W., 1968, THIN FILM TECHNOLOGY
[3]  
KACZYNSKI I, 1961, TYTAN
[4]  
MUNSTER A, 1957, Z PHYS CHEM, V13, P59
[5]   REACTIVELY EVAPORATED TITANIUM NITRIDE RESISTORS FOR MICROCIRCUITS [J].
ODADNIK, SJ ;
DAS, MB .
MICROELECTRONICS AND RELIABILITY, 1972, 11 (01) :71-&
[6]   OXIDATION KINETICS OF SINGLE CRYSTAL TITANIUM NITRIDE BY OPTICAL MEASUREMENTS [J].
PEARCE, ML ;
BASCH, C .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1969, 52 (09) :496-&
[7]   MISCHKRISTALLBILDUNG IM SYSTEM TIO-TIN [J].
SCHMITZDUMONT, O ;
STEINBERG, K .
NATURWISSENSCHAFTEN, 1954, 41 (05) :117-117
[8]  
WESTWOOD WD, 1975, TANTALUM THIN FILMS