SELF-ION SPUTTERING YIELDS FOR COPPER, NICKEL, AND ALUMINUM

被引：24

作者：

ALLAS, RG

KNUDSON, AR

LAMBERT, JM

TREADO, PA

REYNOLDS, GW

机构：

[1] GEORGETOWN UNIV,WASHINGTON,DC 20375

[2] USN,RES LAB,WASHINGTON,DC 20375

[3] SUNY ALBANY,ALBANY,NY 12222

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1982年 / 194卷 / 1-3期

关键词：

D O I：

10.1016/0029-554X(82)90592-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：615 / 619

页数：5

共 7 条

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ALMEN, O ;

BRUCE, G .

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[2]

ANDERSON HH, 1980, SPUTTERING ION BOMBA, pCH4

[3]

HIRVONEN JK, 1976, TREATISE MATERIALS S, V18

[4] STUDY OF SPUTTERING PROCESS WITH RUTHERFORD BACKSCATTERING [J].

KRAUTLE, H .

NUCLEAR INSTRUMENTS & METHODS, 1976, 137 (03) :553-557

REYNOLDS, GW ;

KNUDSON, AR ;

GOSSETT, CR .

NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :179-185

[6]

SIGMUND P, 1980, SPUTTERING ION BOMBA, pCH2

[7]

Ziegler J. F, 1977, HELIUM STOPPING POWE