SINGLE-ELECTRON TUNNELING EFFECTS IN GRANULAR METAL-FILMS

被引:76
作者
BARSADEH, E [1 ]
GOLDSTEIN, Y [1 ]
ZHANG, C [1 ]
DENG, H [1 ]
ABELES, B [1 ]
MILLO, O [1 ]
机构
[1] EXXON RES & ENGN CO, ANNANDALE, NJ 08801 USA
关键词
D O I
10.1103/PhysRevB.50.8961
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cryogenic scanning tunneling microscopy is used to study local electrical-transport properties of thin granular Au/Al2O3 films in the vicinity of the percolation threshold. The current-voltage characteristics are found to vary dramatically from one tip position to another over distances of the order of a few nanometers. These characteristics often exhibit interesting Coulomb-staircase structures having unusual variations in step widths and heights due to complex tunneling paths. A triple-barrier tunnel-junction model accounts quantitatively for the experimental results.
引用
收藏
页码:8961 / 8964
页数:4
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