STABILITY TO MOISTURE FOR CHEMICALLY VAPOUR-DEPOSITED BORON-NITRIDE

被引:88
作者
MATSUDA, T
机构
关键词
D O I
10.1007/BF01174496
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:2353 / 2357
页数:5
相关论文
共 11 条
[1]  
Basche M., 1964, U.S. Pat., Patent No. [3, 152, 006, 3152006]
[2]  
Economy J., 1967, J POLYM SCI C, V19, P283
[3]  
GEBHARDT JJ, 1973, 4TH INT C CHEM VAP D, P460
[4]   NORMAL MODES IN HEXAGONAL BORON NITRIDE [J].
GEICK, R ;
PERRY, CH ;
RUPPRECH.G .
PHYSICAL REVIEW, 1966, 146 (02) :543-&
[5]   DENSITY AND DEPOSITION RATE OF CHEMICAL-VAPOR-DEPOSITED BORON-NITRIDE [J].
MATSUDA, T ;
NAKAE, H ;
HIRAI, T .
JOURNAL OF MATERIALS SCIENCE, 1988, 23 (02) :509-514
[6]   SYNTHESIS AND STRUCTURE OF CHEMICALLY VAPOR-DEPOSITED BORON-NITRIDE [J].
MATSUDA, T ;
UNO, N ;
NAKAE, H ;
HIRAI, T .
JOURNAL OF MATERIALS SCIENCE, 1986, 21 (02) :649-658
[7]   LOW-TEMPERATURE DEPOSITION OF HEXAGONAL BN FILMS BY CHEMICAL VAPOR-DEPOSITION [J].
MOTOJIMA, S ;
TAMURA, Y ;
SUGIYAMA, K .
THIN SOLID FILMS, 1982, 88 (03) :269-274
[8]  
OCONNOR TE, 1966, Patent No. 3241919
[9]   PREPARATION AND PROPERTIES OF THIN FILM BORON NITRIDE [J].
RAND, MJ ;
ROBERTS, JF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (04) :423-&
[10]   CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS OF BN ONTO FUSED-SILICA AND SAPPHIRE [J].
SANO, M ;
AOKI, M .
THIN SOLID FILMS, 1981, 83 (02) :247-251