ANISOTROPIC ETCHING OF SILICON AT HIGH-PRESSURE

被引：12

作者：

ABBOTT, AP ^{[1
]}

CAMPBELL, SA ^{[1
]}

SATHERLEY, J ^{[1
]}

SCHIFFRIN, DJ ^{[1
]}

机构：

[1] UNIV PORTSMOUTH,DEPT CHEM,PORTSMOUTH PO1 2DT,ENGLAND

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1993年 / 348卷 / 1-2期

关键词：

D O I：

10.1016/0022-0728(93)80154-A

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

[No abstract available]

引用

收藏

页码：473 / 479

页数：7

相关论文

共 17 条

[1] POTENTIAL DEPENDENCE OF THE INTERFACIAL IMPEDANCE OF P-(100) SILICON IN KOH
ABBOTT, AP
SCHIFFRIN, DJ
CAMPBELL, SA
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1992, 328 (1-2): : 355 - 360
[2] [Anonymous], 1991, HYDROGEN SEMICONDUCT
[3] Bard A. J., 2001, ELECTROCHEMICAL METH, V2nd, P50
[4] Bassous E., 1978, IEEE, VED-25, P1179
[5] ANISOTROPIC ETCHING OF SILICON
BEAN, KE
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1185 - 1193
[6] CHEMICAL AND ELECTROCHEMICAL ANISOTROPIC DISSOLUTION OF SILICON IN ETHYLENEDIAMINE PLUS PYROCATECHOL PLUS WATER MEDIA
CAMPBELL, SA
SCHIFFRIN, DJ
TUFTON, PJ
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1993, 344 (1-2) : 211 - 233
[7] OPTIMIZATION OF HYDRAZINE-WATER SOLUTION FOR ANISOTROPIC ETCHING OF SILICON IN INTEGRATED-CIRCUIT TECHNOLOGY
DECLERCQ, MJ
GERZBERG, L
MEINDL, JD
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (04) : 545 - 552
[8] KERN W, 1978, RCA REV, V39, P278
[9] Laidler K. J., 1965, CHEM KINETICS
[10] HYDROGEN DIFFUSION AND THE CATALYSIS OF ENHANCED OXYGEN DIFFUSION IN SILICON AT TEMPERATURES BELOW 500-DEGREES-C
NEWMAN, RC
TUCKER, JH
BROWN, AR
MCQUAID, SA
[J]. JOURNAL OF APPLIED PHYSICS, 1991, 70 (06) : 3061 - 3070