AN X-RAY-LITHOGRAPHY SYSTEM

[1] ALQUIST CN, 1979, MICROCIRCUIT ENG 197, P339

[2] BUCKLEY WD, 1978, MAY EL SOC M SEATTL

[3] BUCKLEY WD, 1980, MAY EL SOC M ST LOUI

[4] BUCKLEY WD, 1976, ELECTRON ION BEAM SC, P453

[5] KING MC, 1977, SOLID STATE TECHNOL, V2, P37

[6] X-RAY-LITHOGRAPHY SOURCE USING A STATIONARY SOLID PD TARGET [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1942 - 1945

[7] OOSTERKAMP WJ, 1948, PHILIPS RES REP, V3, P303

[8] Rao G U, 1974, Med Phys, V1, P204, DOI 10.1118/1.1637296

[9] TSAI NH, 1980, SEMICONDUCTOR MICROL

[10] WARDLY GA, 1977, INT C MICROLITHOGRAP

[1] ALQUIST CN, 1979, MICROCIRCUIT ENG 197, P339

[2] BUCKLEY WD, 1978, MAY EL SOC M SEATTL

[3] BUCKLEY WD, 1980, MAY EL SOC M ST LOUI

[4] BUCKLEY WD, 1976, ELECTRON ION BEAM SC, P453

[5] KING MC, 1977, SOLID STATE TECHNOL, V2, P37

[6] X-RAY-LITHOGRAPHY SOURCE USING A STATIONARY SOLID PD TARGET [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1942 - 1945

[7] OOSTERKAMP WJ, 1948, PHILIPS RES REP, V3, P303

[8] Rao G U, 1974, Med Phys, V1, P204, DOI 10.1118/1.1637296

[9] TSAI NH, 1980, SEMICONDUCTOR MICROL

[10] WARDLY GA, 1977, INT C MICROLITHOGRAP