CHEMICAL VAPOR-DEPOSITION OF TIO2 FILM USING AN ORGANOMETALLIC PROCESS AND ITS PHOTOELECTROCHEMICAL BEHAVIOR

被引：45

作者：

TAKAHASHI, Y ^{[1
]}

TSUDA, K ^{[1
]}

SUGIYAMA, K ^{[1
]}

MINOURA, H ^{[1
]}

MAKINO, D ^{[1
]}

TSUIKI, M ^{[1
]}

机构：

[1] GIFU UNIV,FAC ENGN,DEPT IND CHEM,KAKAMIGAHARA,GIFU 504,JAPAN

来源：

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I | 1981年 / 77卷

关键词：

D O I：

10.1039/f19817701051

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1051 / 1057

页数：7

共 15 条

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[5] FORMATION OF HYDROGEN GAS WITH AN ELECTROCHEMICAL PHOTO-CELL
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[6] Fujishima A, 1969, J CHEM SOC JAPAN, V72, P108
[7] SEMICONDUCTOR ELECTRODES .10. PHOTOELECTROCHEMICAL BEHAVIOR OF SEVERAL POLYCRYSTALLINE METAL-OXIDE ELECTRODES IN AQUEOUS-SOLUTIONS
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[8] SEMICONDUCTOR ELECTRODES .1. CHEMICAL VAPOR-DEPOSITION AND APPLICATION OF POLYCRYSTALLINE N-TYPE TITANIUM-DIOXIDE ELECTRODES TO PHOTOSENSITIZED ELECTROLYSIS OF WATER
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (06) : 739 - 742
[9] SEMICONDUCTOR ELECTRODES .5. APPLICATION OF CHEMICALLY VAPOR-DEPOSITED IRON-OXIDE FILMS TO PHOTOSENSITIZED ELECTROLYSIS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (07) : 1024 - 1026
[10] TIO2 ANTIREFLECTION COATINGS BY A LOW-TEMPERATURE SPRAY PROCESS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (06) : 983 - 985

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