THERMAL-EXPANSION OF ALN, SAPPHIRE, AND SILICON

被引：543

作者：

YIM, WM ^{[1
]}

PAFF, RJ ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 03期

关键词：

D O I：

10.1063/1.1663432

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1456 / 1457

页数：2

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