DIFFUSION OF RADIOACTIVE ANTIMONY IN SILICON

被引：31

作者：

ROHAN, JJ

PICKERING, NE

KENNEDY, J

机构：

来源：

关键词：

D O I：

10.1149/1.2427476

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：705 / 709

页数：5

共 15 条

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