CATHODIC ARC PLASMA DEPOSITION TECHNOLOGY

被引:87
作者
RANDHAWA, H
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D O I
10.1016/0040-6090(88)90494-4
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:175 / 185
页数:11
相关论文
共 23 条
[1]  
AKSENOV II, 1978, SOV TECH PHYS LETT, V3, P525
[2]  
Bunshah R. F., 1982, DEPOSITION TECHNOLOG
[3]   CATHODE SPOTS AND VACUUM ARCS [J].
DAALDER, JE .
PHYSICA B & C, 1981, 104 (1-2) :91-106
[4]  
DAALDER JE, 1978, THESIS TH EINDHOVEN
[5]  
HARRIS LP, 1980, ARC CATHODE PHENOMEN, P127
[6]  
JOHNSON PC, 1987, SOC VACUUM COATERS
[7]   CATHODE SPOT EROSION AND IONIZATION PHENOMENA IN TRANSITION FROM VACUUM TO ATMOSPHERIC-PRESSURE ARCS [J].
KIMBLIN, CW .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) :5235-5244
[8]  
LUMEER VM, 1978, SOV PHYS TECH PHYS, V22, P858
[9]   SPUTTERING IN VACUUM ARCS [J].
MILLER, HC .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1979, 12 (08) :1293-1298
[10]  
MULARIE WM, 1984, Patent No. 4430184