MECHANISM OF ION FORMATION AND ION EMISSION DURING SPUTTERING

被引:52
作者
BENNINGHOVEN, A
机构
来源
ZEITSCHRIFT FUR PHYSIK | 1969年 / 220卷 / 02期
关键词
D O I
10.1007/BF01394745
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
It is demonstrated that the degree of ionization of secondary particles emitted from a solid surface under ion bombardment cannot be predicted by the Saha-Langmuir equation. For an understanding of the ion emission it is necessary to separate the process of ion formation and the following emission. There exists a great number of different processes resulting in the formation of an ion on the surface. These processes can be disentangled by means of a systematical mass spectrometrical analysis. The probability for an ion to leave the surface without neutralization depends on various parameters as ionization potential and velocity of the emitted particle, work function and temperature of the surface etc. © 1969 Springer-Verlag.
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页码:159 / +
页数:1
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