HIGH-FREQUENCY RESPONSE OF CAPACITORS FABRICATED FROM FINE-GRAIN BATIO3 THIN-FILMS

被引:22
作者
SINGH, PK
COCHRANE, S
LIU, WT
CHEN, K
KNORR, DB
BORREGO, JM
RYMASZEWSKI, EJ
LU, TM
机构
[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,DEPT CHEM,TROY,NY 12180
[2] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,DEPT PHYS,TROY,NY 12180
[3] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,DEPT MAT ENGN,TROY,NY 12180
关键词
D O I
10.1063/1.114140
中图分类号
O59 [应用物理学];
学科分类号
摘要
Fine grain BaTiO3 thin films with a grain size ranging between 100 and 1000 Å were deposited using the reactive partially ionized beam deposition technique at 550-600°C. A metal/insulator/metal structure of these materials was fabricated and the dielectric response was measured up to 40 GHz using a network analyzer. It is shown that these films are not ferroelectric. However, these films show a dielectric relaxation in the frequency interval between several MHz and 1 GHz. We propose that this indicates a relaxation mechanism not related to the ferroelectric domain walls.© 1995 American Institute of Physics.
引用
收藏
页码:3683 / 3685
页数:3
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