DEFECT STRUCTURE AND GENERATION OF INTERFACE STATES IN MOS STRUCTURES

被引:21
作者
DOTHANH, L
ASLAM, M
BALK, P
机构
关键词
D O I
10.1016/0038-1101(86)90186-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:829 / 840
页数:12
相关论文
共 41 条
[1]  
Aslam M., 1983, Insulating Films on Semiconductors. Proceedings of the International Conference INFOS 83, P103
[2]   NATURE OF ELECTRON AND HOLE TRAPS IN MOS SYSTEMS WITH POLY-SI ELECTRODE [J].
ASLAM, M ;
SINGH, R ;
BALK, P .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 84 (02) :659-668
[3]  
ASLAM M, 1984, SOLID STATE ELECTRON, V27, P709
[4]   GENERATION OF INTERFACE STATES IN MOS SYSTEMS [J].
BALK, P ;
KLEIN, N .
THIN SOLID FILMS, 1982, 89 (04) :329-338
[5]  
Balk P., 1983, Solid State Devices 1983. Thirteenth European Solid State Device Research Conference (ESSDERC) and the Eighth Symposium on Solid State Device Technology (SSSDT), P63
[6]   SI-SIO2 FAST INTERFACE STATE MEASUREMENTS [J].
BROWN, DM ;
GRAY, PV .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (07) :760-+
[7]  
CHANG CC, 1977, IEEE T ELECTRON DEV, V24, P1429
[8]  
DoThanh L., 1983, Insulating Films on Semiconductors. Proceedings of the International Conference INFOS 83, P16
[9]  
DOTHANH L, 1985, UNPUB INSULATING FIL
[10]  
DOTHANH L, UNPUB