PHYSICAL PROPERTIES OF SPUTTERED AMORPHOUS GE - ROLE OF DEPOSITION RATE

被引:13
作者
KOC, S
ZAVETOVA, M
ZEMEK, J
RENNER, O
机构
来源
CZECHOSLOVAK JOURNAL OF PHYSICS SECTION B | 1972年 / B 22卷 / 12期
关键词
D O I
10.1007/BF01689909
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:1296 / &
相关论文
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