CU-O FILMS PRODUCED BY REACTIVE DC SPUTTERING

被引：17

作者：

KLEIN, W

SCHMITT, H

BOFFGEN, M

机构：

[1] Fachbereich Physik, Universität des Saarlandes

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90377-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Conditions for the production of pure CuO and Cu2O films as well as their mixtures by reactive d.c. diode sputtering have been investigated. It is shown that the composition of the films depends strongly on the partial pressure of oxygen during the sputtering process and that the whole range of compositions in the CuO system can be produced. © 1990.

引用

页码：247 / 254

页数：8

共 16 条

[1] EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS [J].