CONTROL OF PINHOLES IN EPITAXIAL COSI2 LAYERS ON SI(111)

[1] BATSTONE JL, 1987, MATER RES SOC S P, V91, P445

[2] SILICON METAL SILICIDE HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1980, 37 (07) : 643 - 646

[3] HIGH-TEMPERATURE NUCLEATION AND SILICIDE FORMATION AT THE CO/SI(111)-7X7 INTERFACE - A STRUCTURAL INVESTIGATION [J]. PHYSICAL REVIEW B, 1986, 34 (02): : 913 - 920

[4] ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1982, 46 (05): : 849 - 862

[5] STRUCTURAL-ANALYSIS OF AN SI/COSI2/SI HETEROSTRUCTURE USING ULTRAHIGH RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY [J]. THIN SOLID FILMS, 1986, 137 (02) : 351 - 361

[6] INSITU STUDY OF THE MOLECULAR-BEAM EPITAXY OF COSI2 ON (111) SI BY TRANSMISSION ELECTRON-MICROSCOPY AND DIFFRACTION [J]. APPLIED PHYSICS LETTERS, 1987, 51 (01) : 45 - 47

[7] HELLMAN F, IN PRESS PHYS REV B

[8] ELECTRICAL TRANSPORT-PROPERTIES OF COSI2 AND NISI2 THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 913 - 915

[9] HUNT BD, 1986, MATER RES SOC S P, V56, P151

[10] HUNT BD, 1987, UNPUB MAT RES SOC SP

[1] BATSTONE JL, 1987, MATER RES SOC S P, V91, P445

[2] SILICON METAL SILICIDE HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1980, 37 (07) : 643 - 646

[3] HIGH-TEMPERATURE NUCLEATION AND SILICIDE FORMATION AT THE CO/SI(111)-7X7 INTERFACE - A STRUCTURAL INVESTIGATION [J]. PHYSICAL REVIEW B, 1986, 34 (02): : 913 - 920

[4] ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1982, 46 (05): : 849 - 862

[5] STRUCTURAL-ANALYSIS OF AN SI/COSI2/SI HETEROSTRUCTURE USING ULTRAHIGH RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY [J]. THIN SOLID FILMS, 1986, 137 (02) : 351 - 361

[6] INSITU STUDY OF THE MOLECULAR-BEAM EPITAXY OF COSI2 ON (111) SI BY TRANSMISSION ELECTRON-MICROSCOPY AND DIFFRACTION [J]. APPLIED PHYSICS LETTERS, 1987, 51 (01) : 45 - 47

[7] HELLMAN F, IN PRESS PHYS REV B

[8] ELECTRICAL TRANSPORT-PROPERTIES OF COSI2 AND NISI2 THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 913 - 915

[9] HUNT BD, 1986, MATER RES SOC S P, V56, P151

[10] HUNT BD, 1987, UNPUB MAT RES SOC SP