LARGE-AREA DIAMOND FILM GROWTH IN A LOW-PRESSURE FLAME

被引：28

作者：

GLUMAC, NG

GOODWIN, DG

机构：

[1] Division of Engineering and Applied Science, California Institute of Technology, Pasadena

来源：

MATERIALS LETTERS | 1993年 / 18卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0167-577X(93)90109-B

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Chemical vapor deposition of a large-area (13 cm(2)) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.

引用

收藏

页码：119 / 122

页数：4

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