ANGULAR-DISTRIBUTION OF SI ATOMS SPUTTERED BY KEV AR+ IONS

被引:46
作者
OKUTANI, T
SHIKATA, M
ICHIMURA, S
SHIMIZU, R
机构
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D O I
10.1063/1.327957
中图分类号
O59 [应用物理学];
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页码:2884 / 2887
页数:4
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共 12 条
[1]  
BETZ G, 1970, NEDERL TIJEDSCHRIFT, V8, P203
[2]  
CHIPLONKAR VT, 1965, INDIAN J PURE AP PHY, V3, P131
[3]   SPUTTERING OF SILVER BY LIGHT IONS WITH ENERGIES FROM 2 TO 12 KEV [J].
GRONLUND, F ;
MOORE, WJ .
JOURNAL OF CHEMICAL PHYSICS, 1960, 32 (05) :1540-1545
[4]   ANGULAR AND ENERGY DISTRIBUTIONS IN SECONDARY IONIC EMISSIONS .3. ANGULAR DISTRIBUTION AND IONIC YIELD [J].
HENNEQUIN, JF .
JOURNAL DE PHYSIQUE, 1968, 29 (10) :957-+
[5]   SPUTTER-EROSION AND IMPURITY EMISSION FROM TITANIUM AND VANADIUM AT LOW-ENERGY ION-BOMBARDMENT [J].
HOFER, WO ;
BAY, HL ;
MARTIN, PJ .
JOURNAL OF NUCLEAR MATERIALS, 1978, 76-7 (1-2) :156-162
[6]   SPUTTERING OF SI WITH KEV AR+ IONS .1. MEASUREMENT AND MONTE-CARLO CALCULATIONS OF SPUTTERING YIELD [J].
KANG, ST ;
SHIMIZU, R ;
OKUTANI, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (09) :1717-1725
[7]   COMPOSITION VARIATIONS AS A FUNCTION OF EJECTION ANGLE IN SPUTTERING OF ALLOYS [J].
OLSON, RR ;
WEHNER, GK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :319-321
[8]   MASS EFFECTS ON ANGULAR-DISTRIBUTION OF SPUTTERED ATOMS [J].
OLSON, RR ;
KING, ME ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3677-3683
[9]   EXPERIMENTS BY RADIOACTIVE TRACER METHODS ON SPUTTERING BY RARE-GAS IONS [J].
PATTERSON, H ;
TOMLIN, DH .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1962, 265 (1323) :474-&
[10]   SIMULTANEOUS MEASUREMENTS OF PHOTON AND ION EMISSIONS FROM ION BOMBARDED A1 IN AN OXYGEN ATMOSPHERE [J].
SHIMIZU, R ;
OKUTANI, T ;
ISHITANI, T ;
TAMURA, H .
SURFACE SCIENCE, 1977, 69 (01) :349-353