SPECTROMETER FOR MEASURING SECONDARY-ELECTRON YIELDS INDUCED BY ION IMPACTS ON THIN-FILM OXIDE SURFACES

被引：51

作者：

DIETZ, LA ^{[1
]}

SHEFFIELD, JC ^{[1
]}

机构：

[1] GE, KNOLLS ATOM POWER LAB, SCHENECTADY, NY 12301 USA

来源：

关键词：

D O I：

10.1063/1.1686078

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：183 / 191

页数：9

共 13 条

[1]

CARTER G, 1968, ION BOMBARDMENT SOLI, pCH3

[2]

Davidon W.C., 1959, ANL5990

[3] MEASUREMENT OF STATISTICS OF SECONDARY ELECTRON EMISSION [J].

DELANEY, CFG ;

WALTON, PW .

[4]

Dietz L. A., 1970, International Journal of Mass Spectrometry and Ion Physics, V5, P11, DOI 10.1016/0020-7381(70)87002-4

DIETZ, LA ;

HANRAHAN, LR ;

HANCE, AB .

[6]

DIETZ LA, 1967, KAPL3352 KNOLLS AT P

[7]

DIETZ LA, 1972, ADVANCES XRAY ANALYS, V15, P36

[8] A RAPIDLY CONVERGENT DESCENT METHOD FOR MINIMIZATION [J].

FLETCHER, R ;

POWELL, MJD .

[9]

KAMINSKY M, 1965, ATOMIC IONIC IMPACT, pCH14

[10]

KENDALL MG, 1969, ADV THEORY STAT, V1, P128