WIDE APERTURE SELF-SUSTAINED DISCHARGE KRF AND XECL LASERS

[1] CORKUM PB, UNPUB IEEE J QUANTUM

[2] INJECTION-LOCKED UNSTABLE RESONATOR RARE-GAS HALIDE DISCHARGE LASER OF NARROW LINEWIDTH AND HIGH SPATIAL QUALITY [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (02) : 235 - 241

[3] JAIN K, 1982, SPIE C MICROLITHOGRA

[4] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 374 - 375

[5] NECESSARY CONDITIONS FOR THE HOMOGENEOUS FORMATION OF PULSED AVALANCHE DISCHARGES AT HIGH GAS-PRESSURES [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 210 - 222

[6] X-RAY PREIONIZATION FOR ELECTRIC-DISCHARGE LASERS [J]. APPLIED PHYSICS LETTERS, 1979, 34 (08) : 505 - 508

[7] UV PICOSECOND PULSE AMPLIFICATION BY A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 636 - 638

[8] MCKEE TJ, 1980, PHYS CAN, V36, P41

[9] TAYLOR RS, 1981, C LASERS ELECTRO OPT

[10] TAYLOR RS, UNPUB IEEE J QUANTUM

[1] CORKUM PB, UNPUB IEEE J QUANTUM

[2] INJECTION-LOCKED UNSTABLE RESONATOR RARE-GAS HALIDE DISCHARGE LASER OF NARROW LINEWIDTH AND HIGH SPATIAL QUALITY [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (02) : 235 - 241

[3] JAIN K, 1982, SPIE C MICROLITHOGRA

[4] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 374 - 375

[5] NECESSARY CONDITIONS FOR THE HOMOGENEOUS FORMATION OF PULSED AVALANCHE DISCHARGES AT HIGH GAS-PRESSURES [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 210 - 222

[6] X-RAY PREIONIZATION FOR ELECTRIC-DISCHARGE LASERS [J]. APPLIED PHYSICS LETTERS, 1979, 34 (08) : 505 - 508

[7] UV PICOSECOND PULSE AMPLIFICATION BY A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 636 - 638

[8] MCKEE TJ, 1980, PHYS CAN, V36, P41

[9] TAYLOR RS, 1981, C LASERS ELECTRO OPT

[10] TAYLOR RS, UNPUB IEEE J QUANTUM