USE OF CHOPPED LASER-LIGHT IN ELECTRONIC SPECKLE PATTERN INTERFEROMETRY

被引:23
作者
LOKBERG, OJ
机构
[1] Norwegian Institute of Technology, Physics Department, Trondheim
来源
APPLIED OPTICS | 1979年 / 18卷 / 14期
关键词
D O I
10.1364/AO.18.002377
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Shortened exposure of each TV frame is used in conjunction with time-average ESPI to study the sinusoidal vibrations of extremely unstable objects. The effect of short exposures upon the fringe functions is calculated. It is shown how sinusoidal phase modulation techniques can be used at all realistic exposure values. We also discuss how double-exposure ESPI with a cw laser can be used to study more random movements, e.g. of biological objects. The lag characteristic of the TV target is used to extend the time separation. Fringe patterns illustrating applications of these techniques are presented. © 1979 Optical Society of America.
引用
收藏
页码:2377 / 2384
页数:8
相关论文
共 14 条
[1]   TIME AVERAGE HOLOGRAPHY EXTENDED [J].
ALEKSOFF, CC .
APPLIED PHYSICS LETTERS, 1969, 14 (01) :23-&
[2]  
Butters J. N., 1971, Optics and Laser Technology, V3, P26, DOI 10.1016/S0030-3992(71)80007-5
[3]   APPLICATION OF ESPI TO NDT [J].
BUTTERS, JN .
OPTICS AND LASER TECHNOLOGY, 1977, 9 (03) :117-123
[4]  
BUTTERS JN, 1976, ENG USES COHERENT OP, P155
[5]   PULSED LASERS IN ELECTRONIC SPECKLE PATTERN INTERFEROMETRY [J].
COOKSON, TJ ;
BUTTERS, JN ;
POLLARD, HC .
OPTICS AND LASER TECHNOLOGY, 1978, 10 (03) :119-124
[6]   DETECTION AND MEASUREMENT OF SMALL VIBRATIONS USING ELECTRONIC SPECKLE PATTERN INTERFEROMETRY [J].
HOGMOEN, K ;
LOKBERG, OJ .
APPLIED OPTICS, 1977, 16 (07) :1869-1875
[7]   USE OF MODULATED REFERENCE WAVE IN ELECTRONIC SPECKLE PATTERN INTERFEROMETRY [J].
LOKBERG, OJ ;
HOGMOEN, K .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1976, 9 (10) :847-851
[8]   VIBRATION PHASE MAPPING USING ELECTRONIC SPECKLE PATTERN INTERFEROMETRY [J].
LOKBERG, OJ ;
HOGMOEN, K .
APPLIED OPTICS, 1976, 15 (11) :2701-2704
[9]   VIBRATION MEASUREMENT ON THE HUMAN EAR DRUM INVIVO [J].
LOKBERG, OJ ;
HOGMOEN, K ;
HOLJE, OM .
APPLIED OPTICS, 1979, 18 (06) :763-765
[10]  
MACOVSKI A, 1971, APPL OPT, V16, P2722