ION-IMPLANTATION AS AN INDUSTRIAL-PROCESS

被引:8
作者
BOSTON, ME [1 ]
LEGG, KO [1 ]
机构
[1] BIRL IND RES LAB,EVANSTON,IL 60201
关键词
D O I
10.1016/0257-8972(92)90295-L
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In contrast with other surface treatment processes such as physical vapour deposition coating, ion implantation has experienced very little growth. It is presently used only in certain small niche markets, and has never attained the status of a standard industrial treatment process. The reasons for this are examined, and it is concluded that customer perceptions of the process pose serious problems for its acceptance. If it is to be accepted at all, its price must be reduced. Ways to lower the price are suggested, including increased chamber size, beam current, and process efficiency. The various points to consider in choosing between different solutions are discussed. In illustration, a design for an industrial-sized implantation system is described.
引用
收藏
页码:540 / 545
页数:6
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