THERMAL VIBRATION AMPLITUDES AND STRUCTURE OF AS ON SI(001)

被引:24
作者
FRANKLIN, GE
FONTES, E
QIAN, Y
BEDZYK, MJ
GOLOVCHENKO, JA
PATEL, JR
机构
[1] CORNELL HIGH ENERGY SYNCHROTRON SOURCE,ITHACA,NY 14853
[2] NORTHWESTERN UNIV,DEPT MAT SCI & ENGN,EVANSTON,IL 60208
[3] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439
[4] ROWLAND INST SCI INC,CAMBRIDGE,MA 02142
[5] UNIV MUNICH,SEKT PHYS,D-80539 MUNICH,GERMANY
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 11期
关键词
D O I
10.1103/PhysRevB.50.7483
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using the x-ray standing-wave method, we have measured directly the thermal vibration amplitudes [u(2)] of symmetric As dimers on a Si(001)-(2X1) surface. For sample temperatures in the range 300 K less than or equal to T less than or equal to 650 K, the results are Debye-like. Above 650 K [u(2)] varies more rapidly, indicating the onset of defect-mediated processes. We also found that at room temperature the bond length of the As dimers is 2.58+/-0.04 Angstrom A and that, independent of temperature, they sit 1.40+/-0.01 Angstrom A above the top bulk-extrapolated silicon (004) plane. These results provide a critical test for theoretical structure calculations.
引用
收藏
页码:7483 / 7487
页数:5
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