EPITAXIAL GROWTH OF INDIUM ANTIMONIDE FILMS AS STUDIED IN SITU BY ELECTRON DIFFRACTION

被引：15

作者：

KHAN, IH

机构：

来源：

关键词：

D O I：

10.1016/0039-6028(68)90180-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：306 / &

共 12 条

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[4] INDIUM ANTIMONIDE - A REVIEW OF ITS PREPARATION, PROPERTIES AND DEVICE APPLICATIONS
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MULLIN, JB
[J]. SOLID-STATE ELECTRONICS, 1962, 5 (JUL-A) : 211 - +
[5] KEHOE RB, 1956, THESIS LONDON
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[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) : 3691 - &
[8] ON FORMATION OF SINGLE CRYSTAL FILMS OF FCC METALS ON ALKALI HALIDE CLEAVAGE PLANES IN ULTRAHIGH VACUUM
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[J]. PHYSICA STATUS SOLIDI, 1966, 18 (01): : 441 - &
[9] LAVERKO EN, 1966, SOV PHYS CRYSTALLOGR, V10, P611
[10] NEWMAN RC, 1955, PHILOS MAG, V46, P927