A GALLIUM ARSENIDE DOUBLE INFECTION DIODE

被引:8
作者
SAUNDERS, IJ
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D O I
10.1016/0038-1101(68)90007-5
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1165 / &
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共 16 条
[1]   DOUBLE INJECTION IN DEEP-LYING IMPURITY SEMICONDUCTORS [J].
ASHLEY, KL ;
MILNES, AG .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :369-&
[2]   FILAMENTARY INJECTION IN SEMI-INSULATING SILICON [J].
BARNETT, AM ;
MILNES, AG .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (11) :4215-&
[3]   BEHAVIOR OF LATTICE DEFECTS IN GAAS [J].
BLANC, J ;
WEISBERG, LR ;
BUBE, RH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1964, 25 (02) :225-&
[4]  
Bube R. H., 1960, PHOTOCONDUCTIVITY SO, P292
[5]   CURRENT-CONTROLLED NEGATIVE RESISTANCE IN THIN NIOBIUM OXIDE FILMS [J].
CHOPRA, KL .
PROCEEDINGS OF THE IEEE, 1963, 51 (06) :941-&
[6]  
HENISCH HK, 1957, RECTIFYING SEMICONDU, P131
[7]   DOUBLE INJECTION DIODES AND RELATED DI PHENOMENA IN SEMICONDUCTORS [J].
HOLONYAK, N .
PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1962, 50 (12) :2421-&
[8]  
KEATING PN, 1964, PHYS REV A-GEN PHYS, V135, P1407
[9]   DOUBLE INJECTION IN INSULATORS [J].
LAMPERT, MA .
PHYSICAL REVIEW, 1962, 125 (01) :126-&
[10]   EFFECT OF LIGHT ON POPULATION OF RECOMBINATION CENTERS IN STRUCTURES EXHIBITING DOUBLE INJECTION (77DEGREESK PHOTOCONDUCTIVITY NEGATIVE RESISTANCE SI P-PI-N T/E) [J].
MARSH, OJ ;
BARON, R ;
MAYER, JW .
APPLIED PHYSICS LETTERS, 1965, 7 (05) :120-&