HIGH-LOW DISPLACIVE TRANSITION IN THE ALL-SILICA FORM OF THE AIPO4-5 TOPOLOGY

被引：10

作者：

RICHARDSON, JW

SMITH, JV

HAN, SX

机构：

[1] UNIV CHICAGO,CTR ADV RADIAT SOURCES,CHICAGO,IL 60637

[2] ARGONNE NATL LAB,INTENSE PULSED NEUTRON SOURCE,ARGONNE,IL 60439

来源：

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS | 1990年 / 86卷 / 12期

关键词：

D O I：

10.1039/ft9908602341

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：2341 / 2342

页数：2

共 30 条

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