DIAGNOSTICS OF FILM GROWTH IN PLASMA CHEMICAL VAPOR-DEPOSITION

被引:6
作者
KNIGHTS, JC
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词
D O I
10.1116/1.575601
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:2060 / 2060
页数:1
相关论文
共 5 条
[1]   HIGH-INFORMATION INFRARED-SPECTROSCOPY OF UNSTABLE MOLECULES [J].
CHOLLET, P ;
GUELACHVILI, G ;
MORILLONCHAPEY, M ;
GRESSIER, P ;
SCHMITT, JPM .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) :687-695
[2]   HIGH-RESOLUTION ABSORPTION AND EMISSION-SPECTROSCOPY OF A SILANE PLASMA IN THE 1800-2300 CM-1 RANGE [J].
KNIGHTS, JC ;
SCHMITT, JPM ;
PERRIN, J ;
GUELACHVILI, G .
JOURNAL OF CHEMICAL PHYSICS, 1982, 76 (07) :3414-3421
[3]  
KNIGHTS JC, 1987, P EUROPEAN MRS
[4]  
PERRIN J, IN PRESS APPL PHYS L
[5]  
SHAW JN, COMMUNICATION