AUTOMATIC PATTERN POSITIONING OF SCANNING ELECTRON BEAM EXPOSURE

[1] BREIKS J, 1964, JUL S EL BEAM TECH M

[2] A NEW HIGH RESOLUTION REFLECTION SCANNING ELECTRON MICROSCOPE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (08) : 1040 - &

[3] Chang TH, 1967, 9TH IEEE S EL ION LA, P123

[4] HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) : 251 - +

[5] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[6] KANAYA K, 1966, 6 INT C EL MICR, P281

[7] KANAYA K, 1967, B ELECTROTECH LAB TO, V31, P203

[8] KU HY, 1969, J ELECTROCHEM SOC, P980

[9] MIYAUCHI S, 1969, SOLID STATE TECH

[10] PERKINS KD, 1968, P KODAK PHOTORESIS S, V1, P39

[1] BREIKS J, 1964, JUL S EL BEAM TECH M

[2] A NEW HIGH RESOLUTION REFLECTION SCANNING ELECTRON MICROSCOPE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (08) : 1040 - &

[3] Chang TH, 1967, 9TH IEEE S EL ION LA, P123

[4] HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) : 251 - +

[5] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[6] KANAYA K, 1966, 6 INT C EL MICR, P281

[7] KANAYA K, 1967, B ELECTROTECH LAB TO, V31, P203

[8] KU HY, 1969, J ELECTROCHEM SOC, P980

[9] MIYAUCHI S, 1969, SOLID STATE TECH

[10] PERKINS KD, 1968, P KODAK PHOTORESIS S, V1, P39