Investigation of Preparation Conditions and Microstructure of Mn-N Films by Reactive Sputtering

被引：1

作者：

Chiba, Masafumi ^{[1
]}

Naito, Shinya ^{[1
]}

机构：

[1] Tokai Univ, Sch High Technol Human Welf, Dept Mat Chem, 317 Nishino, Numazu, Shizuoka 4100395, Japan

来源：

E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2008年 / 6卷

关键词：

Sputter deposition; Manganese; Nitrides; Polycrystalline thin films; Magnetic films;

D O I：

10.1380/ejssnt.2008.115

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The crystal structure of manganese nitride material depends on the chemical composition. In this paper, we report the crystal structure of manganese nitride which depends on the deposition condition of a flow ratio of argon and nitrogen, F-N { = N-2 = (Ar + N-2)}. The samples were fabricated by an RF-sputtering method. Argon and nitrogen were used as a reactive sputtering gas. The crystal structure of the obtained films was analyzed by X-ray diffraction (XRD) measurements. The stoichiometry of the film under F-N = 5-100 % was evaluated as Mn3N2. The lattice spacing d of (101) expands as the nitrogen flow ratio increases. In the case of F-N = 1 %, the composition was evaluated as Mn4N.

引用

页码：115 / 118

页数：4

共 12 条

[1] Magnetic properties and microstructure of Ni-Fe nitride films by reactive sputtering [J].