POLYSILANE EXCITED-STATES AND EXCITED-STATE DYNAMICS

被引:50
作者
THORNE, JRG
REPINEC, ST
ABRASH, SA
ZEIGLER, JM
HOCHSTRASSER, RM
机构
[1] Department of Chemistry, University of Pennsylvania, Philadelphia
基金
美国国家科学基金会;
关键词
D O I
10.1016/0301-0104(90)80052-Y
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Femtosecond time-resolved excited state absorption spectroscopy is used to reveal excited states of linear-chain poly(di-n-hexylsilane) about 1 eV and in the range of 3.5 eV above the lowest excited state. A description of the excited state dynamics following optical excitation in polysilanes is presented. The concept of conjugation length is discussed in relation to experiments on the saturation of excited state absorption signals observed at high excitation density. © 1990.
引用
收藏
页码:315 / 325
页数:11
相关论文
共 25 条
[1]  
ABRASH SA, 1990, IN PRESS J CHEM AUG
[2]   TEMPERATURE-DEPENDENCE OF THE 3RD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITIES IN POLYSILANES AND POLYGERMANES [J].
BAUMERT, JC ;
BJORKLUND, GC ;
JUNDT, DH ;
JURICH, MC ;
LOOSER, JH ;
MILLER, RD ;
RABOLT, J ;
SOORIYAKUMARAN, R ;
SWALEN, JD ;
TWIEG, RJ .
APPLIED PHYSICS LETTERS, 1988, 53 (13) :1147-1149
[3]   ALL-OPTICAL NONLINEARITIES IN ORGANICS [J].
GREENE, BI ;
ORENSTEIN, J ;
SCHMITTRINK, S .
SCIENCE, 1990, 247 (4943) :679-687
[4]  
HARRAH LA, 1987, ACS SYM SER, V358, P482
[5]  
HOLSTEIN T, 1981, LASER SPECTROSCOPY S
[6]   NONLINEAR OPTICAL-PROPERTIES OF THIN-FILMS OF POLYSILANE [J].
KAJZAR, F ;
MESSIER, J ;
ROSILIO, C .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) :3040-3044
[7]  
KEPLER RG, 1987, ADV SILICON BASED PO
[8]   PICOSECOND REORIENTATIONS OF THE TRANSITION DIPOLES IN POLYSILANES USING FLUORESCENCE ANISOTROPY [J].
KIM, YR ;
LEE, M ;
THORNE, JRG ;
HOCHSTRASSER, RM ;
ZEIGLER, JM .
CHEMICAL PHYSICS LETTERS, 1988, 145 (01) :75-80
[9]   DIRECT MEASUREMENTS OF ENERGY-TRANSFER BETWEEN IDENTICAL CHROMOPHORES IN SOLUTION [J].
KIM, YR ;
SHARE, P ;
PEREIRA, M ;
SARISKY, M ;
HOCHSTRASSER, RM .
JOURNAL OF CHEMICAL PHYSICS, 1989, 91 (12) :7557-7562
[10]   SOLUTION PHOTOCHEMISTRY OF POLY(DIALKYLSILANES) - A NEW CLASS OF PHOTORESISTS [J].
MICHL, J ;
DOWNING, JW ;
KARATSU, T ;
MCKINLEY, AJ ;
POGGI, G ;
WALLRAFF, GM ;
SOORIYAKUMARAN, R ;
MILLER, RD .
PURE AND APPLIED CHEMISTRY, 1988, 60 (07) :959-972