DECHANNELING OF ALPHA PARTICLES IN ALUMINUM

被引:10
作者
LETEURTRE, J
HOUSSEAU, N
QUERE, Y
机构
来源
JOURNAL DE PHYSIQUE | 1971年 / 32卷 / 2-3期
关键词
D O I
10.1051/jphys:01971003202-3020500
中图分类号
学科分类号
摘要
引用
收藏
页码:205 / +
页数:1
相关论文
共 19 条
  • [1] COUVE H, 1969, R3741 RAPP CEA
  • [2] DELSARTE G, 1970, R4027 RAPP CEA
  • [3] DESARMOT G, 1970, UNPUBLISHED PAPER
  • [4] IMPLANTATION AND ANNEALING BEHAVIOR OF GROUP 3 AND V DOPANTS IN SILICON AS STUDIED BY CHANNELING TECHNIQUE
    ERIKSSON, L
    DAVIES, JA
    JOHANSSON, NG
    MAYER, JW
    [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) : 842 - +
  • [5] HERMANNE N, 1970, 5 P YUG S SUMM SCHOO
  • [6] HIRSCH PB, 1965, ELECTRON MICROSCOPY
  • [7] Howie A., 1970, Atomic collision phenomena in solids, P34
  • [8] ENERGY DISSIPATION BY IONS IN KEV REGION
    LINDHARD, J
    SCHARFF, M
    [J]. PHYSICAL REVIEW, 1961, 124 (01): : 128 - +
  • [9] Morgan D. V., 1970, Atomic collision phenomena in solids, P476
  • [10] MORY J, 1969, RADIAT EFF, V1, P1