HYDROGEN ISOTOPE TRAPPING IN MATERIALS EXPOSED IN PLT

被引:24
作者
WAMPLER, WR
PICRAUX, ST
COHEN, SA
DYLLA, HF
MCCRACKEN, GM
ROSSNAGEL, SM
MAGEE, CW
机构
[1] PRINCETON UNIV,PLASMA PHYS LAB,PRINCETON,NJ 08544
[2] RCA LABS,DAVID SARNOFF RES CTR,PRINCETON,NJ 08540
关键词
D O I
10.1016/0022-3115(79)90389-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Samples exposed at various minor radii in PLT to small numbers of high power discharges have been analyzed for the amount and depth distribution of implanted hydrogen isotopes and higher Z impurities. Comparisons of the measured H,D concentrations and depth profiles with laboratory implantations and calculated depth profiles give the energy and fluence of the hydrogen implanted in the PLT samples. For a Maxwellian distribution, characteristic temperatures of 500 to 600eV due to plasma charge exchange, and 50 to 350eV due to ions at the plasma edge are obtained. Also a 5-40keV component is observed due to neutral beam injection. © 1979.
引用
收藏
页码:983 / 987
页数:5
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