INTERFACIAL REACTION IN BIMETALLIC SN-CU THIN-FILMS

被引:20
作者
FUJIWARA, K
OHTANI, M
ISU, T
NANGO, S
KAWANAKA, R
SHIMIZU, K
机构
[1] MITSUBISHI ELECT CORP,KITA ITAMI WORKS,ITAMI,HYOGO 664,JAPAN
[2] OSAKA UNIV,INST SCI & IND RES,SUITA,OSAKA 565,JAPAN
关键词
D O I
10.1016/0040-6090(80)90422-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:153 / 161
页数:9
相关论文
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