PARAMETERS AFFECTING ELECTRON-BEAM SENSITIVITY OF POLY(METHYL METHACRYLATE)

被引：34

作者：

GIPSTEIN, E ^{[1
]}

OUANO, AC ^{[1
]}

JOHNSON, DE ^{[1
]}

NEED, OU ^{[1
]}

机构：

[1] IBM CORP,RES DIV LAB,SAN JOSE,CA 95193

来源：

关键词：

D O I：

10.1147/rd.212.0143

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：143 / 153

页数：11

共 42 条

[1] THE DEGRADATION OF SOLID POLYMETHYLMETHACRYLATE BY IONIZING RADIATION
ALEXANDER, P
CHARLESBY, A
ROSS, M
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 223 (1154): : 392 - 404
[2] BENOIT H, 1966, 3RD INT SEM GEL PERM
[3] BOWDEN M, 1973, 165TH NAT ACS M DALL
[4] BOWDEN MJ, 1975, J POLYM SCI POL SYM, P221
[5] CHAPIRO A, 1962, RADIATION CHEMISTRY
[6] CHARLESBY A, 1960, ATOMIC RADIATION POL
[7] CHLANDA EP, 1971, J APPL POLYMER SCI, V15, P1195
[8] Dole M., 1973, RAD CHEM MACROMOLECU, VII, P97
[9] DOOLITTLE A, 1965, PLASTICIZER TECHNOLO, pCH1
[10] SPATIAL CONFIGURATION OF MACROMOLECULAR CHAINS
FLORY, PJ
[J]. SCIENCE, 1975, 188 (4195) : 1268 - 1276