PARAMETERS AFFECTING ELECTRON-BEAM SENSITIVITY OF POLY(METHYL METHACRYLATE)

被引：34

作者：

GIPSTEIN, E ^{[1
]}

OUANO, AC ^{[1
]}

JOHNSON, DE ^{[1
]}

NEED, OU ^{[1
]}

机构：

[1] IBM CORP,RES DIV LAB,SAN JOSE,CA 95193

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1977年 / 21卷 / 02期

关键词：

D O I：

10.1147/rd.212.0143

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

收藏

页码：143 / 153

页数：11

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