REACTION OF SILICON WITH CHLORINE AND ULTRAVIOLET-LASER INDUCED CHEMICAL ETCHING MECHANISMS

被引：57

作者：

SESSELMANN, W

HUDECZEK, E

BACHMANN, F

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.584474

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1284 / 1294

页数：11

共 42 条

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