THE CHEMICAL-VAPOR-DEPOSITION OF INDIUM AND COPPER INDIUM ALLOYS FROM METAL HEXAFLUORACETYLACETONATE COMPLEXES

被引：14

作者：

JONES, PA ^{[1
]}

JACKSON, AD ^{[1
]}

PILKINGTON, RD ^{[1
]}

LICKISS, PD ^{[1
]}

机构：

[1] UNIV SALFORD,DEPT CHEM & APPL CHEM,SALFORD M5 4WT,LANCS,ENGLAND

来源：

THIN SOLID FILMS | 1993年 / 229卷 / 01期

关键词：

D O I：

10.1016/0040-6090(93)90398-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5 / 7

页数：3

共 11 条

[1]

JOSHI KC, 1977, COORDIN CHEM REV, V22, P27

[2] LOW-TEMPERATURE METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION (LTMOCVD) OF DEVICE-QUALITY COPPER-FILMS FOR MICROELECTRONIC APPLICATIONS [J].

KALOYEROS, AE ;

FENG, A ;

GARHART, J ;

BROOKS, KC ;

GHOSH, SK ;

SAXENA, AN ;

LUEHRS, F .

JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (03) :271-276

[3] INDIUM-TIN OXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION [J].

MARUYAMA, T ;

FUKUI, K .

JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) :3848-3851

[4] ORGANOMETALLIC MOLECULAR PRECURSORS FOR LOW-TEMPERATURE MOCVD OF III-V SEMICONDUCTORS [J].

MAURY, F .

ADVANCED MATERIALS, 1991, 3 (11) :542-&

[5]

MAZURENKO EA, 1988, UKR KHIM ZH, V54, P1235

[6] THIN COPPER-FILMS BY PLASMA CVD USING COPPER-HEXAFLUORO-ACETYLACETONATE [J].

OEHR, C ;

SUHR, H .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (02) :151-154

[7]

PILKINGTON RD, 1991, J PHYS, V4, P263

[8] CUINSE2 FOR PHOTOVOLTAIC APPLICATIONS [J].

ROCKETT, A ;

BIRKMIRE, RW .

JOURNAL OF APPLIED PHYSICS, 1991, 70 (07) :R81-R97

[9] CHEMICAL VAPOR-DEPOSITION OF COPPER FROM COPPER (II) HEXAFLUOROACETYLACETONATE [J].

TEMPLE, D ;

REISMAN, A .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (11) :3525-3529

[10] VAPOR DEPOSITION OF METALS BY HYDROGEN REDUCTION OF METAL CHELATES [J].

VANHEMER.RL ;

SPENDLOV.LB ;

SIEVERS, RE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (11) :1123-&

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