OPTICAL-ABSORPTION IN ULTRATHIN SILICON-OXIDE FILM

被引：16

作者：

MIYATA, N

MORIKI, K

FUJISAWA, M

HIRAYAMA, M

MATSUKAWA, T

HATTORI, T

机构：

[1] MITSUBISHI ELECTR CO, LSI RES & DEV LAB, ITAMI, HYOGO 664, JAPAN

[2] UNIV TOKYO, INST SOLID STATE PHYS, TANASHI, TOKYO 188, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 11期

关键词：

D O I：

10.1143/JJAP.28.2072

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L2072 / L2074

页数：3

共 8 条

[1]

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ARAI, K ;

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ABE, Y .

PHYSICAL REVIEW B, 1988, 38 (17) :12772-12775

[3]

LUPASHKO EA, 1970, OPT SPECTROSC-USSR, V29, P419

[4]

PANTELIDES ST, 1978, PHYSICS SIO2 ITS INT

[5] OPTICAL PROPERTIES OF NON-CRYSTALLINE SI, SIO, SIOX AND SIO2 [J].

PHILIPP, HR .

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[6] AN OPTICAL CHARACTERIZATION OF NATIVE OXIDES AND THIN THERMAL OXIDES ON SILICON [J].

PHILIPP, HR ;

TAFT, EA .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (07) :5224-5229

[7] OPTICAL-ABSORPTION AND PHOTOCONDUCTIVITY IN THERMALLY GROWN SIO2-FILMS [J].

POWELL, RJ ;

MORAD, M .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) :2499-2502

[8]

WEINBERG ZA, 1979, PHYS REV B, V19, P3107, DOI 10.1103/PhysRevB.19.3107

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